Type(s) de contenu et mode(s) de consultation : Texte noté : électronique

Auteur(s) : El-Kareh, Badih  Voir les notices liées en tant qu'auteur

Titre(s) : Silicon devices and process integration [Texte électronique] : deep submicron and nano-scale technologies / Badih El-Kareh

Publication : New York, NY : Springer Science+Business Media, 2009

Description matérielle : 1 ressource dématérialisée

Note(s) : Includes bibliographical references and index
"Silicon Devices and Process Integration covers state-of-the-art silicon devices, their characteristics, and interactions with process parameters. It serves as a comprehensive guide which addresses both the theoretical and practical aspects of modern silicon devices and the relationship between their electrical properties and processing conditions. The book is compiled from the author's industrial and academic lecture notes." "This book is written for engineers and scientists in semiconductor research, development and manufacturing. The problems at the end of each chapter and the numerous charts, figures and tables also make it appropriate for use as a text in graduate and advanced undergraduate courses in electrical engineering and materials science."--Jacket

Indice(s) Dewey :  621.381 5 (23e éd.) = Composants et circuits (électronique)  Voir les notices liées en tant que sujet

Identifiants, prix et caractéristiques : ISBN 9780387690100

Identifiant de la notice  : ark:/12148/cb44643130t

Notice n° :  FRBNF44643130 (notice reprise d'un réservoir extérieur)

Table des matières : Silicon properties ; Junctions and contacts ; The bipolar transistor ; The MOS structure ; Insulated-gate field-effect transistor ; Analog devices and passive components ; Enabling processes and integration ; applications.